发明名称 Method for Manufacturing Evaporation Donor Substrate and Light-Emitting Device
摘要 An evaporation donor substrate which enables only a desired evaporation material to be evaporated at the time of deposition by an evaporation method, and capable of reduction in manufacturing cost by increase in use efficiency of the evaporation material and deposition with high uniformity. An evaporation donor substrate capable of controlling laser light so that a desired position of an evaporation donor substrate is irradiated with the laser light in accordance with the wavelength of the emitted laser light at the time of evaporation. Specifically, an evaporation donor substrate in which a region which reflects laser light and a region which absorbs laser light at the time of irradiation with laser light having a wavelength of greater than or equal to 400 nm and less than or equal to 600 nm at the time of evaporation are formed.
申请公布号 US2012088324(A1) 申请公布日期 2012.04.12
申请号 US201113329624 申请日期 2011.12.19
申请人 YOKOYAMA KOHEI;IBE TAKAHIRO;TSURUME TAKUYA;TANAKA KOICHIRO;SEMICONDUCTOR ENERGY LABORATORY CO., LTD. 发明人 YOKOYAMA KOHEI;IBE TAKAHIRO;TSURUME TAKUYA;TANAKA KOICHIRO
分类号 H01L33/60 主分类号 H01L33/60
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