发明名称 SIMULTANEOUSLY MEASUREMENT DEVICE FOR BEAM PROFILE, POSITION AND EMITTANCE
摘要 PURPOSE: A device for measuring a shape, a location, and an emittance of a beam is provided to reduce a session for measuring physical properties of a beam because a shape, a location, and an emittance of the beam are measured at the same time without interference in a progression of the beam. CONSTITUTION: A device(10) for measuring a shape, a location, and an emittance of a beam comprises a frame(20), a first wire(35), and second wire(45). The frame comprises a through hole(25). A beam passes through the through hole. The first wire is arranged to cross the through hole to a horizontal direction. The second wire is installed to be moved to the horizontal direction with respect to the frame.
申请公布号 KR20120034425(A) 申请公布日期 2012.04.12
申请号 KR20100095977 申请日期 2010.10.01
申请人 KOREA INSTITUTE OF RADIOLOGICAL & MEDICAL SCIENCES 发明人 KANG, KUN UK;KANG, JOON SUN;KIM, GEUN BEOM;PARK, YEUN SOO;AN, DONG HYUN;YANG, TAE KEUN;LEE, MIN YONG;JUNG, IN SU;HONG, BONG HWAN;HONG, SUNG SEK;HWANG, WON TAEK
分类号 G01T1/29 主分类号 G01T1/29
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