发明名称 CATADIOPTRIC PROJECTION OPTICAL SYSTEM, EXPOSURE EQUIPMENT AND EXPOSURE METHOD
摘要 <P>PROBLEM TO BE SOLVED: To provide a catadioptric projection optical system using a liquid immersion method which has a large numerical aperture without enlarging the sizes of constituent optical members. <P>SOLUTION: A catadioptric projection optical system PL1 forms an image of a first surface R1 on a second surface. The catadioptric projection optical system PL1 includes at least six mirrors M1-M6 and comprises a first imaging optical system G1 which forms a first intermediate image and a second intermediate image of the first surface R1, and a second imaging optical system G2 which relays the second intermediate image onto the second surface. <P>COPYRIGHT: (C)2012,JPO&INPIT
申请公布号 JP2012073632(A) 申请公布日期 2012.04.12
申请号 JP20110252890 申请日期 2011.11.18
申请人 NIKON CORP 发明人 OMURA YASUHIRO
分类号 G02B17/08;H01L21/027 主分类号 G02B17/08
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