PROCESSING LIQUID SUPPLYING APPARATUS AND SUBSTRATE PROCESSING APPARATUS INCLUDING THE SAME

摘要

PROBLEM TO BE SOLVED: To provide a processing liquid supplying apparatus capable of supplying a plurality of kinds of processing liquid in a clean state while suppressing the increase in the apparatus cost and a substrate processing apparatus including the same.

SOLUTION: A substrate processing apparatus 1 includes: a processing chamber 10 that performs processing of a substrate W by using processing liquid; and a processing liquid supplying apparatus 30 having a mixing valve 33. The mixing valve 33 includes: a pure water introduction port 46 disposed at a middle position of a mixing section 36 formed of a cylindrical member having a rectangular parallelepiped shape; an SC1 outlet 47 that leads out an SC1 generated at the mixing section 36 and is disposed at one end side of the mixing section 36; and an SC2 outlet 48 that leads out an SC2 generated at the mixing section 36 and is disposed at the other end side of the mixing section 36. The SC1 and SC2 generated at the mixing valve 33 flow inside the mixing section 36 in directions opposite to each other and are led out from the SC1 outlet 47 and the SC2 outlet 48, respectively.

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