METHOD OF MANUFACTURING Cu-Ga ALLOY SPUTTERING TARGET AND THE Cu-Ga ALLOY SPUTTERING TARGET

摘要

PROBLEM TO BE SOLVED: To manufacture a high-quality Cu-Ga alloy sputtering target.

SOLUTION: Cu-Ga alloy powder obtained by alloying a powder mixture of Cu powder and Ga powder blended by the mass proportion of 85:15-55:45 at a temperature of 30-400°C under an inert atmosphere is heat-treated at a temperature of 400-900°C under a vacuum or the inert atmosphere, and then pressurized and sintered.

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