SUBSTRATE PROCESSING DEVICE FOR SUPPLYING REACTION GAS THROUGH SYMMETRY-TYPE INLET AND OUTLET

摘要

A substrate processing device according to one embodiment of the present invention comprises: a chamber wherein substrate processing takes place; a substrate support mounted inside the chamber and whereon the substrate is placed; and a showerhead formed by an inlet for supplying reaction gas inside the chamber and an outlet for discharging the reaction gas supplied inside the chamber forming a symmetry, wherein the reaction gas generally flows in an equal direction as the substrate inside the chamber.