SUBSTRATE PROCESSING DEVICE EQUIPPED WITH SEMICIRCLE SHAPED ANTENNA

摘要

A substrate processing device according to one embodiment of the present invention comprises: a chamber wherein substrate processing takes place; a substrate support mounted inside the chamber and whereon the substrate is placed; and an antenna mounted on the upper portion of the chamber and forming an electric field inside the chamber, wherein the antenna is provided with a first antenna and a second antenna placed to form a symmetry on the basis of a preset center line, the first antenna comprises a first inside antenna and a first middle antenna having a first radius and a second radius respectively and placed on one side and the other side of the preset center line respectively, and a first connection antenna for interconnecting the first inside antenna and the first middle antenna, and the second antenna comprises a semicircle-shaped second middle antenna and a second inside antenna having the first radius and the second radius respectively and placed on one side and the other side of the center line respectively, and a second connection antenna for interconnecting the second middle antenna and the second inside antenna.