FILM COATING APPARATUS FOR SEMICONDUCTOR PROCESS

摘要

The present invention relates to a film coating apparatus. The film coating apparatus includes: a main roller (10) contacting the other surface of a film; a coating roller (20) parallel and adjacent to the main roller (10) to contact one surface of the film; a coating solution supply roller (30) parallel and adjacent and spaced from the coating roller (20) on a side opposite to that of the main roller (10), the coating solution supply roller (30) applying a coating solution on a surface of the coating roller (20) after the coating solution is smeared on a surface of the coating solution supply roller (30) in a state where a lower portion of the coating solution supply roller (30) is immersed into a coating solution reservoir (39); a film guide part (40) guiding the film into a gap between the main roller (10) and the coating roller (20); a curing unit (50) curing the film on which the coating solution is applied while passing through the gap between the main roller (10) and the coating roller (20) at a high temperature; and a conveyor (60) transferring the film to pass through the curing unit (40).