发明名称 Semiconductor device having a resistor and methods of forming the same
摘要 In a semiconductor device and a method of making the same, the semiconductor device comprises a substrate including a first region and a second region. At least one first gate structure is on the substrate in the first region, the at least one first gate structure including a first gate insulating layer and a first gate electrode layer on the first gate insulating layer. At least one isolating structure is in the substrate in the second region, a top surface of the isolating structure being lower in height than a top surface of the substrate. At least one resistor pattern is on the at least one isolating structure.
申请公布号 US8154104(B2) 申请公布日期 2012.04.10
申请号 US20080077379 申请日期 2008.03.19
申请人 SHIN JINHYUN;KIM MINCHUL;CHO SEONG SOON;CHOI SEUNGWOOK;SAMSUNG ELECTRONICS CO., LTD. 发明人 SHIN JINHYUN;KIM MINCHUL;CHO SEONG SOON;CHOI SEUNGWOOK
分类号 H01L27/06 主分类号 H01L27/06
代理机构 代理人
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