发明名称 Wafer singulation process
摘要 A method of singulating a semiconductor die from a wafer is provided. The method includes etching or cutting several trenches into the wafer from a front surface of the wafer, such that each trench extends along an entire side of the die; depositing a passivation layer into the trenches to form a passivation plug on at least a bottom of the trenches to protect the dies and immobilize them during singulation; and forming a rigid carrier layer or plate at the first side of the wafer to secure the dies. The wafer is then ground from the back side to expose the bottom of each trench, a metal layer is formed on the back surface of the wafer; dicing tape is added, the carrier layer is removed, and the die is separated from the wafer by laser cutting or by flexing the tape.
申请公布号 US8153464(B2) 申请公布日期 2012.04.10
申请号 US20060582756 申请日期 2006.10.18
申请人 MONTGOMERY ROBERT;INTERNATIONAL RECTIFIER CORPORATION 发明人 MONTGOMERY ROBERT
分类号 H01L21/00 主分类号 H01L21/00
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