发明名称 |
Photosensitive composition remover |
摘要 |
A photosensitive composition remover used for removal of an uncured photosensitive composition, which remover comprises 1 to 80 percent by mass of at least one type of aromatic hydrocarbon having 9 carbon atoms or more within the molecule. The photosensitive composition remover further comprises an aprotic polar solvent and/or another solvent other than aprotic polar solvents. The photosensitive composition remover is effective for removal of an uncured photosensitive composition film deposited at the periphery, edges, or back of a substrate or removal of an uncured photosensitive composition deposited at the surface of system members or equipment in a process for forming a photosensitive composition film on a glass substrate, a semiconductor wafer, or the like. It is preferably used for removal of a photosensitive composition containing a pigment. |
申请公布号 |
US8153357(B2) |
申请公布日期 |
2012.04.10 |
申请号 |
US20040582787 |
申请日期 |
2004.12.14 |
申请人 |
KANEDA MASATO;MIKAWA YASUHIRO;SHIMIZU KOJI;TERAO KOUICHI;SHOWA DENKO K.K. |
发明人 |
KANEDA MASATO;MIKAWA YASUHIRO;SHIMIZU KOJI;TERAO KOUICHI |
分类号 |
G03F7/30;C11D7/24;C11D7/50;G03F7/00;G03F7/16;G03F7/32 |
主分类号 |
G03F7/30 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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