发明名称 |
SOLUTION BASED PRECURSORS |
摘要 |
Solution-based precursors for use as starting materials in film deposition processes, such as atomic layer deposition, chemical vapor deposition and metalorganic chemical vapor deposition. The solution-based precursors allow for the use of otherwise solid precursors that would be unsuitable for vapor phase deposition processes because of their tendency to decompose and solidify during vaporization. |
申请公布号 |
KR20120034166(A) |
申请公布日期 |
2012.04.10 |
申请号 |
KR20117031053 |
申请日期 |
2010.07.01 |
申请人 |
LINDE AG. |
发明人 |
MA CE;KIM, KEE CHAN;MCFARLANE GRAHAM ANTHONY |
分类号 |
C07F7/00;C07F9/00;C23C16/00 |
主分类号 |
C07F7/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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