| 发明名称 |
Apparatus and method for repairing photo mask |
| 摘要 |
An apparatus for repairing a photo mask, including a repairing atomic force microscope configured to repair a defective portion of the photo mask in a photo mask repair process, an electron microscope configured to navigate the repairing atomic electron microscope to the defective portion of the photo mask and to observe the photo mask repair process, and an imaging atomic microscope configured to image in-situ a shape of a repaired photo mask. |
| 申请公布号 |
US8153338(B2) |
申请公布日期 |
2012.04.10 |
| 申请号 |
US20100805416 |
申请日期 |
2010.07.29 |
| 申请人 |
PARK BYONG CHON;AHN SANG JUNG;CHOI JIN HO;LYOU JOON;HONG JAE WAN;SONG WON YOUNG;JUNG KI YOUNG;NANOFOCUS INC.;KOREA RESEARCH INSTITUTE OF STANDARDS AND SCIENCE |
发明人 |
PARK BYONG CHON;AHN SANG JUNG;CHOI JIN HO;LYOU JOON;HONG JAE WAN;SONG WON YOUNG;JUNG KI YOUNG |
| 分类号 |
G03F1/00;G06K9/00;G21G5/00 |
主分类号 |
G03F1/00 |
| 代理机构 |
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