| 摘要 |
<p>An exhaust system structure of a film formation apparatus includes an exhaust line (51) configured to discharge exhaust gas from inside a process container (11); an automatic pressure controller (52) disposed on the exhaust line (51) near the process container (11); a vacuum pump (54) disposed on the exhaust line (51) downstream from the automatic pressure controller (52); an oxidizing agent supply section (57) configured to supply an oxidizing agent into the exhaust line (51) at a position downstream from the automatic pressure controller (52); a trap mechanism (53) disposed on the exhaust line (51) downstream from the position at which the oxidizing agent is supplied and configured to collect a product generated by a reaction of the oxidizing agent with an organic metal source gas component and a by-product contained in the exhaust gas; and a detoxification unit (55) disposed on the exhaust line (51) downstream from the trap mechanism (53).</p> |
