| 发明名称 |
Method and system for mask optimization |
| 摘要 |
A method and apparatus for mask optimization is provided. Mask design and production is optimized by providing proper weighting parameters for critical features. The parameters may include information such as parametric information, functional information, and hot spots determination. |
| 申请公布号 |
US8156450(B2) |
申请公布日期 |
2012.04.10 |
| 申请号 |
US20060612422 |
申请日期 |
2006.12.18 |
| 申请人 |
CHAN KEVIN;DREGE EMMANUEL;JAKATDAR NICKHIL;LITVINTSEVA SVETLANA;MILLER MARK A.;RAQUEL FRANCIS;CADENCE DESIGN SYSTEMS, INC. |
发明人 |
CHAN KEVIN;DREGE EMMANUEL;JAKATDAR NICKHIL;LITVINTSEVA SVETLANA;MILLER MARK A.;RAQUEL FRANCIS |
| 分类号 |
G06F17/50 |
主分类号 |
G06F17/50 |
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