发明名称 Photoelectric conversion element and manufacturing method of photoelectric conversion element
摘要 An object is to provide a photoelectric conversion element having a side surface with different taper angles by conducting etching of a photoelectric conversion layer step-by-step. A pin photodiode has a high response speed compared with a pn photodiode but has a disadvantage of large dark current. One cause of the dark current is considered to be conduction through an etching residue which is generated in etching and deposited on a side surface of the photoelectric conversion layer. Leakage current of the photoelectric conversion element is reduced by forming a structure in which a side surface has two different tapered shapes, which conventionally has a uniform surface, so that the photoelectric conversion layer has a side surface of a p-layer and a side surface of an n-layer, which are not in the same plane.
申请公布号 US8154096(B2) 申请公布日期 2012.04.10
申请号 US20100834040 申请日期 2010.07.12
申请人 SASAGAWA SHINYA;HASEGAWA SHINYA;TAKAHASHI HIDEKAZU;ARAO TATSUYA;SEMICONDUCTOR ENERGY LABORATORY CO., LTD. 发明人 SASAGAWA SHINYA;HASEGAWA SHINYA;TAKAHASHI HIDEKAZU;ARAO TATSUYA
分类号 H01L27/14;H01L31/00;H01L31/0232 主分类号 H01L27/14
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