发明名称 Immersion supporting plate cleaning method and a pattern forming method
摘要 An immersion supporting plate cleaning method of cleaning an immersion supporting plate provided around a substrate to be processed in immersion exposure. An immersion boundary between an immersion area contact part and an immersion area noncontact part on the immersion supporting plate formed when an immersion area is moved according to a predetermined exposure area and an exposure map is determined in advance. Then, the immersion supporting plate is cleaned while a cleaning jig is being moved along the determined immersion boundary.
申请公布号 US8153355(B2) 申请公布日期 2012.04.10
申请号 US20070898322 申请日期 2007.09.11
申请人 ITO SHINICHI;KABUSHIKI KAISHA TOSHIBA 发明人 ITO SHINICHI
分类号 G03F7/26 主分类号 G03F7/26
代理机构 代理人
主权项
地址