发明名称 Method for fabricating memory
摘要 A method for fabricating a memory is described. Word lines are provided in a first direction. Bit lines are provided in a second direction. A top electrode is formed connecting to a corresponding word line. A bottom electrode is formed connecting to a corresponding bit line. A resistive layer is formed on the bottom electrode. At least two separate L-shaped liners are formed, wherein each L-shaped liner has variable resistive materials on both ends of the L-shaped liner and each L-shaped liner is coupled between the top electrode and the resistive layer.
申请公布号 US8153485(B2) 申请公布日期 2012.04.10
申请号 US201113163769 申请日期 2011.06.20
申请人 LAI ERH-KUN;HO CHIA-HUA;HSIEH KUANG-YEU;MACRONIX INTERNATIONAL CO., LTD. 发明人 LAI ERH-KUN;HO CHIA-HUA;HSIEH KUANG-YEU
分类号 H01L21/8238 主分类号 H01L21/8238
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