发明名称 |
VOID DETECTION FABRICATING OF PHASE CHANGE RANDOM ACCESS MEMORY |
摘要 |
<p>PURPOSE: A void detection method of a phase change memory device is provided to easily detect a void generated in a phase change device, thereby improving operation speed of the phase change memory device. CONSTITUTION: A junction word line(110) is formed by injecting impurities on the front surface of a semiconductor substrate(100) with a predetermined depth. A plurality of switching devices(135) is arranged on the semiconductor substrate. An ohmic contact layer(136) is selectively formed on the upper part of the switching device. A gap-fill layer(145) is formed on the front surface of the semiconductor substrate in which a spacer(140) is formed. A phase change material layer is buried in the front surface of the semiconductor substrate in which the gap-fill layer is formed.</p> |
申请公布号 |
KR20120033910(A) |
申请公布日期 |
2012.04.09 |
申请号 |
KR20100095663 |
申请日期 |
2010.09.30 |
申请人 |
SK HYNIX INC. |
发明人 |
KWON, YOUNG SEOK;KIM, JIN HYOCK;LEE, KEUN |
分类号 |
H01L21/66;H01L21/8247;H01L27/115 |
主分类号 |
H01L21/66 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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