发明名称 VOID DETECTION FABRICATING OF PHASE CHANGE RANDOM ACCESS MEMORY
摘要 <p>PURPOSE: A void detection method of a phase change memory device is provided to easily detect a void generated in a phase change device, thereby improving operation speed of the phase change memory device. CONSTITUTION: A junction word line(110) is formed by injecting impurities on the front surface of a semiconductor substrate(100) with a predetermined depth. A plurality of switching devices(135) is arranged on the semiconductor substrate. An ohmic contact layer(136) is selectively formed on the upper part of the switching device. A gap-fill layer(145) is formed on the front surface of the semiconductor substrate in which a spacer(140) is formed. A phase change material layer is buried in the front surface of the semiconductor substrate in which the gap-fill layer is formed.</p>
申请公布号 KR20120033910(A) 申请公布日期 2012.04.09
申请号 KR20100095663 申请日期 2010.09.30
申请人 SK HYNIX INC. 发明人 KWON, YOUNG SEOK;KIM, JIN HYOCK;LEE, KEUN
分类号 H01L21/66;H01L21/8247;H01L27/115 主分类号 H01L21/66
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