BLOCK COPOLYMER AND METHOD OF FORMING PATTERNS BY USING THE SAME

摘要

PURPOSE: Block copolymer and a pattern forming method using the same are provided to implement the vertical orientation of the block copolymer and pattern small sized areas based on chemical bonds to the surface of a substrate. CONSTITUTION: A pattern forming method is based on ketene-based random copolymer and block copolymer. The method includes the following: the ketene-based random copolymer is applied on a substrate; the ultraviolet ray treatment or thermal treatment is applied to the ketene-based random copolymer; block copolymer is applied on the ketene-based random copolymer; the ultraviolet ray treatment or thermal treatment is applied to the block copolymer; a part of the block copolymer is etched. The ketene-based random copolymer is represented by chemical formula 2.