发明名称 |
MANUFACTURING METHOD OF FILM FORMED SUBSTRATE, FILM FORMED SUBSTRATE, AND FILM FORMING APPARATUS |
摘要 |
<p>PURPOSE: A method for manufacturing a film deposition substrate, a film deposition substrate, and a film deposition apparatus are provided to improve the adhesion between a Molybden layer and a glass substrate by depositing a second Molybden layer with a film on a surface of the first Molybden layer after depositing the first Molybden layer, containing a very small amount of oxygen, on the glass substrates with the film. CONSTITUTION: A back electrode layer(3) is formed on a glass substrate(2). The back electrode layer includes a first Molybden layer(3a) deposited on a surface of the glass substrates and a second Molybden layer(3b) deposited on the surface of the first Molybden layer. A CIGS(Copper Indium Gallium Selenide) layer(4) is formed on the second Molybden layer. A buffer layer(5) is formed on the CIGS layer. A transparent electrode layer(6) is formed on the buffer layer.</p> |
申请公布号 |
KR20120034039(A) |
申请公布日期 |
2012.04.09 |
申请号 |
KR20110099508 |
申请日期 |
2011.09.30 |
申请人 |
SUMITOMO HEAVY INDUSTRIES, LTD. |
发明人 |
IWATA HIROSHI |
分类号 |
H01L31/042;H01L31/0216;H01L31/18 |
主分类号 |
H01L31/042 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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