EXPOSURE EQUIPMENT, EXPOSURE METHOD AND DEVICE MANUFACTURING METHOD

摘要

Exposure apparatus (EX) exposes a substrate (P) by irradiating the substrate (P) with exposure light (EL) via a projection optical system (PL) and a liquid (LQ). The exposure apparatus (EX) is provided with a liquid immersion mechanism (1) for supplying the liquid (LQ) and recovering the liquid (LQ). The liquid immersion mechanism (1) has an inclined surface (2), which is opposite to a surface of the substrate (P) and is inclined with respect to the surface of the substrate (P), and a liquid recovering port (22) of the liquid immersion mechanism (1) is formed in the inclined surface (2). A flat portion (75) is provided between the substrate (P) and the projection optical system (PL). A liquid immersion area can be maintained to be small.