| 摘要 |
PURPOSE: A probe and a manufacturing method thereof are provided to simultaneously generate a plurality of probes, thereby shortening manufacturing time. CONSTITUTION: An area where a first probe(110) and a second probe(120) with micro pitches will be formed is etched from a wafer. The etched area is plated to generate the first probe and the second probe which have a multilayer structure. The probes is coupled wit a circuit board(130). A probe pitch for generating the first and second probes is minutely controlled by etching the wafer. A plurality of multilayer structures of the first probe and the second probe is formed on the wafer. The area except for the areas where a plurality of multilayer structures of the first probe and the second probe will be formed is etched.
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