发明名称 DEPOSITION APPARATUS
摘要 PURPOSE: A deposition apparatus is provided to prevent the unnecessary consumption of process gas since a second exhaust part is closed by a rotary member when the process gas of a storage member is supplied to a main chamber through the opened first exhaust part. CONSTITUTION: A deposition apparatus comprises a main chamber(110), a discharging unit(120), and an emission unit(130). The emission unit comprises a storage member(131) and a rotating member(136). The storage member has first and second exhaust parts(132,133). A part of the first exhaust part coupled with the main chamber is perforated, so the process gas of the internal space is exhausted to the main chamber. A part of the second exhaust part is perforated, so the process gas of the internal space is exhausted to the discharging unit. The rotating member vertically rotates in the storage member.
申请公布号 KR20120033469(A) 申请公布日期 2012.04.09
申请号 KR20100094990 申请日期 2010.09.30
申请人 SNU PRECISION CO., LTD. 发明人 YOON, HYUNG SEOK;NAMGOONG, SUNG TAE;KIM, TAE HWAN;PARK, IL JUN
分类号 C23C14/24 主分类号 C23C14/24
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