| 摘要 |
PURPOSE: A negative type liquid photoresist composition is provided to improve the brittleness of liquid photoresist and to design the photoresist without the restriction of glass transition temperatures and acid values. CONSTITUTION: A negative type liquid photoresist composition includes binder polymer, a photo-polymerization initiator, photo-polymerizable monomer, and an additive. The binder polymer includes one or more acryl-based acid in form of monomer. The acryl-based acid is represented by chemical formula 1. In chemical formula 1, the n is the integer of 1 to 4. One of the binder polymer is the copolymer of (meta)acrylic acid ester and vinyl-based monomer dissolved in a solvent. The glass transition temperature of the binder polymer is between 60 and 150 degrees Celsius. The acid value of the binder polymer is between 65 and 200 mgKOH/g. The weight average molecular weight(Mw) of the binder polymer is between 20,000 and 60,000.
|
