| 摘要 |
PURPOSE: A method for manufacturing a silicon quantum dot thin film containing silicon molecule cluster is provided to obtain the silicon quantum dot thin film by applying partially oxidized silicon quantum dot on a substrate and thermally processing the silicon quantum dot. CONSTITUTION: Silicon nanoparticles are dissolved in an organic solvent. Alkyl group caps the silicon nanoparticles. The organic solvent is an ether-based solvent or tetrahydrofuran. A silicon nanoparticles solution is applied on a silicon substrate. A thermal process is implemented under a vacuum condition to obtain a silicon quantum dot thin film with silicon molecule cluster. The concentration of the silicon nanoparticles solution is between 1 and 20 weight%.
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