FILM DEVELOPING SYSTEM AND METHOD

摘要

PURPOSE: Film exposing system and method are provided to regularly form exposing patterns on a film and to minimize the movement of the film by tightly arranging the film to a film tightly arranging part. CONSTITUTION: A film exposing system includes a light emitting part, a cylindrical roller(160), and a pattern forming part(150). A film is tightly arranged on the surface of the cylindrical roller, and the roller moves. The pattern forming part transfers light irradiated from the light emitting part to the tightly arranged film on the cylindrical roller and forms polarized patterns on the film. The pattern forming part includes a mask. The distance between curvatures of the cylindrical roller and the mask is constant.