| 摘要 |
<p>PURPOSE: A substrate processing apparatus and a substrate processing method thereof are provided to prevent dew condensation by increasing the temperature of a substrate higher than the temperature of a processing chamber. CONSTITUTION: A dry process chamber(31) is comprised of a cylindrical upper member(313) and a lower member(314) which includes a lower wall(316). The upper member and the lower member are closely attached to each other through a sealing material(315). A placement table(39) for mounting a substrate(W) is installed inside of the dry process chamber. A carbon dioxide supply device(32) comprises a carbon dioxide supply source(321), a valve(323), a pipe(322), and a first introduction tube(40). A liquid nitrogen supply device(34) comprises a second introduction tube(341), a liquid nitrogen supply source(342), a pipe(345), and a valve(343).</p> |
