| 摘要 |
PURPOSE: A block copolymer patterning method using dewetting and solvent annealing is provided to enable control of the size and shape of a brush layer by controlling a stepped droplet and a brush mono layer to have a specific pattern. CONSTITUTION: A block copolymer patterning method using dewetting and solvent annealing comprises steps of: pattering a dewetting droplet of copolymer according to the pattern of a micro mold by spin-coating and dewetting a block copolymer solution in the micro mold, transferring the block copolymer dewetting droplet on a substrate from the micro mold, and wetting the dewetting droplet by solvent-annealing the pattern-transferred substrate in a solvent atmosphere.
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