发明名称 |
THIN-FILM SOLAR FABRICATION PROCESS, DEPOSITION METHOD FOR SOLAR CELL PRECURSOR LAYER STACK, AND SOLAR CELL PRECURSOR LAYER STACK |
摘要 |
A method of manufacturing a layer stack adapted for a thin-film solar cell is and a precursor for a solar cell are described. The method includes depositing a TCO layer over a transparent substrate, depositing a first conductive-type layer a first p-i-n junction configured for the solar cell, depositing a first intrinsic-type layer of a first p-i-n junction configured for the solar cell and depositing a further conductive-layer with a conductivity opposite to the first conductive-type layer first p-i-n junction configured for the solar cell. The method further includes providing for a SiOx-containing intermediate layer by chemical vapor deposition and depositing a second p-i-n junction configured for the solar cell, wherein the SiOx-containing intermediate layer is provided within the a further conductive-type layer, and wherein the SiOx-containing layer has a thickness of 17 nm or less.
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申请公布号 |
US2012080081(A1) |
申请公布日期 |
2012.04.05 |
申请号 |
US20100903132 |
申请日期 |
2010.10.12 |
申请人 |
KLEIN STEFAN;STOLLEY TOBIAS;BUSCHBAUM SUSANNE;ROHDE MARTIN;SCHWANITZ KONRAD;STOEMMER CHRISTIAN;APPLIED MATERIALS, INC. |
发明人 |
KLEIN STEFAN;STOLLEY TOBIAS;BUSCHBAUM SUSANNE;ROHDE MARTIN;SCHWANITZ KONRAD;STOEMMER CHRISTIAN |
分类号 |
H01L31/105;H01L31/18 |
主分类号 |
H01L31/105 |
代理机构 |
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代理人 |
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