发明名称 METHOD FOR FORMING ELECTRIC COPPER PLATING FILM ON SURFACE OF RARE EARTH PERMANENT MAGNET
摘要 <p>In order to address the problem of providing a novel method for forming an electric copper plating film with excellent adhesion on the surface of a rare earth permanent magnet, the method of the present invention is characterized by the immersion of a magnet in plating solution, followed by the application of 0.05A/dm2-4.0A/dm2 as the cathode current density for electric copper plating for 10-180 s, to commence processing.</p>
申请公布号 WO2012043717(A1) 申请公布日期 2012.04.05
申请号 WO2011JP72366 申请日期 2011.09.29
申请人 HITACHI METALS, LTD.;KAMACHI MASANAO;YOSHIMURA KOSHI 发明人 KAMACHI MASANAO;YOSHIMURA KOSHI
分类号 H01F41/02;C25D7/00;C25D21/12;H01F1/053;H01F1/08 主分类号 H01F41/02
代理机构 代理人
主权项
地址