| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a pattern forming method using an organic solvent-based developing solution, by which a pattern with reduced bridge defects can be formed, and to provide a rinsing liquid for use in the above method. <P>SOLUTION: The pattern forming method includes steps of (a) forming a film by using a chemically amplified resist composition; (b) exposing the film to light; (c) developing the film by using a developing solution containing an organic solvent; and (d) rinsing the film by using a rinsing liquid containing an organic solvent and having a specific gravity larger than that of the developing solution. <P>COPYRIGHT: (C)2012,JPO&INPIT |
