| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an imprint method, a semiconductor integrated circuit manufacturing method, and a drop recipe preparation method reducing fluctuation in the amount of residual film. <P>SOLUTION: A pattern imprinted on a substrate to be processed is inspected for defects to generate image data containing the defects. When a defect is detected, a defect contour is extracted from the generated image data, the extracted defect contour is reflected in the pattern data of a semiconductor integrated circuit, and a first drop recipe is prepared based on the pattern data which has the defect contour reflected therein. Then, the drop recipe used in applying coating of a hardening resin material is updated with the prepared first drop recipe. <P>COPYRIGHT: (C)2012,JPO&INPIT |
