| 摘要 |
<P>PROBLEM TO BE SOLVED: To suppress generation of thickness unevenness in a residual film of a resist film and an imprint defect due to residual gas, in a method of nanoimprinting by applying a droplet made from a resist material with an ink jet method. <P>SOLUTION: A nanoimprint method is a method of nanoimprinting by applying a droplet made from a resist material with an ink jet method, comprising the steps of: applying a plurality of droplets D under a condition that the viscosity of the resist material is set to within 8 to 20 cP, the surface energy of the resist material is set to within 25 to 35 mN/m, the amount of each droplet D is set to 1 to 10 pl, and the arrangement interval of the droplets D is set to within 10 to 1000 μm so that the crossing angle between a main scanning direction Sm and a line direction Ld of a line-shaped irregularity pattern P2 in the ink jet method at the time of pressing a mold 2 is set to 30° to 90°; and pressing the mold 2 under a condition that the atmosphere is set to He atmosphere and/or pressure-reduced atmosphere. <P>COPYRIGHT: (C)2012,JPO&INPIT |
