发明名称 |
RADIATION-SENSITIVE RESIN COMPOSITION, POLYMER AND COMPOUND |
摘要 |
[Problem] To reduce the time required for a film to exhibit decreased hydrophobicity after liquid immersion lithography while allowing the surface of a film to exhibit high hydrophobicity during liquid immersion lithography. [Solution] A radiation-sensitive resin composition including (A) a polymer that includes a repeating unit (a1) and a fluorine atom, and (B) a photoacid generator, the repeating unit (a1) including a group shown by any of the following formulas (1-1) to (1-3).
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申请公布号 |
US2012082934(A1) |
申请公布日期 |
2012.04.05 |
申请号 |
US201113243046 |
申请日期 |
2011.09.23 |
申请人 |
NAKAHARA KAZUO;SATO MITSUO;ASANO YUSUKE;JSR CORPORATION |
发明人 |
NAKAHARA KAZUO;SATO MITSUO;ASANO YUSUKE |
分类号 |
G03F7/004;C07C69/54;C07C69/604;C07C69/675;C07C255/20;C07C255/23;C08F20/22;C08F20/24 |
主分类号 |
G03F7/004 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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