| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a high-quality titanium target for sputtering, generating no crack or break even in high-power sputtering (high-speed sputtering), and capable of stabilizing the sputtering characteristics. <P>SOLUTION: The high-quality titanium target contains as additional components, at least one element selected from Al, Si, S, Cl, Cr, Fe, Ni, As, Zr, Sn, Sb, B and La in 3-100 ppm by mass in total, and the purity of the target excluding the additional components and gas component is ≥99.99 mass%. <P>COPYRIGHT: (C)2012,JPO&INPIT |
