ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AS WELL AS RESIST FILM AND PATTERN FORMING METHOD USING COMPOSITION

摘要

PROBLEM TO BE SOLVED: To provide an actinic ray-sensitive or radiation-sensitive resin composition that is excellent in resolution such as a critical dimension with no bridge defects, and DOF, as well as a resist film and a pattern forming method using the composition.

SOLUTION: An actinic ray-sensitive or radiation-sensitive resin composition contains a resin that is decomposed by an action of an acid to produce an amide group or a thioamide group.

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