发明名称 NITRIDE-BASED SEMICONDUCTOR ELEMENT AND MANUFACTURING METHOD THEREOF
摘要 <P>PROBLEM TO BE SOLVED: To reduce a contact resistance of a GaN-based semiconductor element that is crystal-grown on a substrate whose surface is inclined at an angle ranging from 1&deg; or more to 5&deg; or less with respect to the m-plane. <P>SOLUTION: A nitride-based semiconductor element comprises a semiconductor laminated structure 20 having a p-type semiconductor region in which a surface 12 is inclined at an angle ranging from 1&deg; or more to 5&deg; or less with respect to the m-plane, and an electrode 30 formed on the p-type semiconductor region. The p-type semiconductor region is formed with an Al<SB POS="POST">x</SB>In<SB POS="POST">y</SB>Ga<SB POS="POST">z</SB>N (x+y+z=1, x&ge;0, y&ge;0, and z&ge;0) layer 26. The electrode 30 includes a Zn layer 32, and the Zn layer 32 contacts with a surface of the p-type semiconductor region of the semiconductor laminated structure 20. <P>COPYRIGHT: (C)2012,JPO&INPIT
申请公布号 JP2012070016(A) 申请公布日期 2012.04.05
申请号 JP20120003857 申请日期 2012.01.12
申请人 PANASONIC CORP 发明人 YOKOKAWA TOSHIYA;OYA MITSUAKI;YAMADA ATSUSHI;ISOZAKI AKIHIRO
分类号 H01L33/32;H01L33/16 主分类号 H01L33/32
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