METHOD FOR DEPOSITING BARRIER LAYERS ON SUBSTRATES FOR HIGH QUALITY FILMS
摘要
Methods of forming barrier films for thin-film photovoltaic devices are provided. The barrier films are deposited at interfaces of the device, such as between conductor layers and layers adjacent thereto, and between photoelectric layers and layers adjacent thereto. The barrier films use dopants to tune refractive index to an intermediate value between the refractive indices of the adjacent layers to provide desired optical properties. The barrier films may also include nucleation species, such as nucleation films or nucleation sites, to stimulate growth of high quality layers adjacent to the barrier films. The barrier films may be bilayer films with a high-density portion for good barrier properties and a low-density portion into which nucleation species may be added by various implantation methods.
申请公布号
WO2011129979(A3)
申请公布日期
2012.04.05
申请号
WO2011US29870
申请日期
2011.03.24
申请人
APPLIED MATERIALS, INC.;SINGH, KAUSHAL, K.;SARAF, GAURAV;EBERSPACHER, CHRIS;SCHUEGRAF, KLAUS;SEVERIN, DANIEL
发明人
SINGH, KAUSHAL, K.;SARAF, GAURAV;EBERSPACHER, CHRIS;SCHUEGRAF, KLAUS;SEVERIN, DANIEL