发明名称 METHOD AND APPARATUS FOR INSPECTING A SURFACE OF A SUBSTRATE
摘要 The present invention provides a method and apparatus for inspecting a surface of a substrate. The apparatus includes: a rotatable stage on which a substrate to be inspected is placed; an inspection optical system having an illumination light source for emitting light to a substrate placed on the stage and a detector for detecting light from the substrate which is irradiated with the light from the illumination light source; an A/D converter for amplifying and A/D converting signals output from the detector in the inspection optical system; and a defect detector for detecting defects in a surface of the substrate by processing signals output from the detector and converted by the A/D converter and classifying the defected defects. The defect detector extracts micro defects in the surface of the substrate by processing the signals output from the detector, and detects linear defects existing discretely in a linear region.
申请公布号 US2012081701(A1) 申请公布日期 2012.04.05
申请号 US201113210418 申请日期 2011.08.16
申请人 SASAZAWA HIDEAKI;ISHIGURO TAKAYUKI;HORIE KIYOTAKA;YANAKA YU;HITACHI HIGH-TECHNOLOGIES CORPORATION 发明人 SASAZAWA HIDEAKI;ISHIGURO TAKAYUKI;HORIE KIYOTAKA;YANAKA YU
分类号 G01N21/88;G01N21/47;G01N21/55 主分类号 G01N21/88
代理机构 代理人
主权项
地址