METHOD AND SYSTEM FOR LASER PATTERNING A SEMICONDUCTOR SUBSTRATE

摘要

A method for laser patterning a sample is presented. The method includes coating at least one side of a substrate to form a sample, where coating the at least one side of the substrate forms an interface between the coating and the at least one side of the substrate. Further, the method includes configuring a scanning pattern for patterning the sample. In addition, the method includes determining settings for one or more laser beams of a laser based on the configured scanning pattern. Moreover, the method includes focusing the one or more laser beams of the laser at or near a surface of the substrate by selecting a focal point of the one or more laser beams near the surface of the substrate and setting a scribe depth near the surface of the substrate. The method also includes patterning the sample based on the configured scanning pattern using the one or more laser beams to generate one or more pixelated devices from the sample.