RADIO-SENSITIVE RESIN COMPOSITION

摘要

The present invention addresses the provision of a radio-sensitive resin composition in which lithographic performance such as LWR, MEEF, depth of focus (DOF) and sensitivity are balanced at high levels when forming a resist pattern. The present invention is a radio-sensitive resin composition containing [A] an acid generator consisting of a sulfonic acid derivative having one to three fluorine atoms, [B] an acid generator consisting of a sulfonic acid derivative having three to nine fluorine atoms and a greater number of fluorine atoms than the acid generator in [A], and [C] a polymer having an acid dissociation group. Either the acid generator in [A] and/or the acid generator in [B] is a compound represented by formula (1) below.