| 摘要 |
<P>PROBLEM TO BE SOLVED: To control the electric field strength distribution of high frequency waves consumed in plasma generation without generating abnormal discharge in an electrode. <P>SOLUTION: The electrode for a plasma processing apparatus capable of supplying gas comprises a dielectric substrate 105a having a predetermined space U formed internally, a lid 107 which isolates the space from a plasma generation space when the electrode is attached to the plasma processing apparatus by closing the predetermined space U airtightly, and a plurality of gas hole columns 105e which penetrate the substrate 105a and the lid 107 and pass through the predetermined space and by which gas holes 105c are isolated from the predetermined space U. <P>COPYRIGHT: (C)2012,JPO&INPIT |
