发明名称 DEFECT INSPECTION METHOD FOR ANTIREFLECTION TRANSPARENT FILM
摘要 <P>PROBLEM TO BE SOLVED: To provide an inspection method enabling accurate detection of a defect by a foreign substance and a defect by a minute change in film thickness around the defect in manufacturing an antireflection film. <P>SOLUTION: A defect inspection method for an antireflection transparent film comprises: imaging and image-processing a surface of an analyte; storing coordinates and the number of defective pixels at a location of a defect which is detected, and a defect image around a portion of the defect; then obtaining density with respect to n pixels in an outer circumferential direction around the portion of the defect of the stored defect image; and further, obtaining and processing density around the defect with respect to the defect image to determine a defect size. <P>COPYRIGHT: (C)2012,JPO&INPIT
申请公布号 JP2012068210(A) 申请公布日期 2012.04.05
申请号 JP20100215496 申请日期 2010.09.27
申请人 TOPPAN PRINTING CO LTD 发明人 KAWASHIMA YOSHIHIKO
分类号 G01N21/892 主分类号 G01N21/892
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