摘要 |
<P>PROBLEM TO BE SOLVED: To provide an inspection method enabling accurate detection of a defect by a foreign substance and a defect by a minute change in film thickness around the defect in manufacturing an antireflection film. <P>SOLUTION: A defect inspection method for an antireflection transparent film comprises: imaging and image-processing a surface of an analyte; storing coordinates and the number of defective pixels at a location of a defect which is detected, and a defect image around a portion of the defect; then obtaining density with respect to n pixels in an outer circumferential direction around the portion of the defect of the stored defect image; and further, obtaining and processing density around the defect with respect to the defect image to determine a defect size. <P>COPYRIGHT: (C)2012,JPO&INPIT |