发明名称 SUBSTRATE CLEANING APPARATUS INCLUDING NON-CONTACT ROTATION UNIT
摘要 <p>The present invention relates to a substrate cleaning apparatus including a non-contact rotation unit. The substrate cleaning apparatus includes: a lower roller (10) rotating with respect to a center of a lower roller shaft (11); an upper roller (20) disposed on an upper side of the lower roller (10) in parallel to the lower roller (10); a lower adhesive roller (30) disposed on a lower side of the lower roller (10) in parallel to the lower roller (10); an upper adhesive roller (40) disposed on an upper side of the upper roller (20) in parallel to the upper roller (20); and a guide roll part (50) rotated with respect to a center of a roll shaft (51) and disposed on a lower portion of a traveling substrate to guide the substrate so that the substrate passes between the upper roller (20) and the lower roller (10); and a driving part (60) rotating at least one of the guide roll part (50), the lower roller (10) and the upper roller (20) and supported and fixed by a frame (1).</p>
申请公布号 WO2012043973(A1) 申请公布日期 2012.04.05
申请号 WO2011KR04772 申请日期 2011.06.29
申请人 HWANG, SUN-OH;CO-MS CO., LTD. 发明人 HWANG, SUN-OH
分类号 H01L21/302 主分类号 H01L21/302
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