发明名称 |
SUBSTRATE CLEANING APPARATUS INCLUDING NON-CONTACT ROTATION UNIT |
摘要 |
<p>The present invention relates to a substrate cleaning apparatus including a non-contact rotation unit. The substrate cleaning apparatus includes: a lower roller (10) rotating with respect to a center of a lower roller shaft (11); an upper roller (20) disposed on an upper side of the lower roller (10) in parallel to the lower roller (10); a lower adhesive roller (30) disposed on a lower side of the lower roller (10) in parallel to the lower roller (10); an upper adhesive roller (40) disposed on an upper side of the upper roller (20) in parallel to the upper roller (20); and a guide roll part (50) rotated with respect to a center of a roll shaft (51) and disposed on a lower portion of a traveling substrate to guide the substrate so that the substrate passes between the upper roller (20) and the lower roller (10); and a driving part (60) rotating at least one of the guide roll part (50), the lower roller (10) and the upper roller (20) and supported and fixed by a frame (1).</p> |
申请公布号 |
WO2012043973(A1) |
申请公布日期 |
2012.04.05 |
申请号 |
WO2011KR04772 |
申请日期 |
2011.06.29 |
申请人 |
HWANG, SUN-OH;CO-MS CO., LTD. |
发明人 |
HWANG, SUN-OH |
分类号 |
H01L21/302 |
主分类号 |
H01L21/302 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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