| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a light-emitting display device without adding a step while simplifying the manufacturing process of a transistor and reducing the number of photomasks. <P>SOLUTION: A step of processing a semiconductor layer into an island shape for each transistor can be omitted by using a substantially intrinsic high-resistance oxide semiconductor for a semiconductor layer included in the transistor. In a step of forming an opening in an insulation layer formed on the semiconductor layer, an unnecessary part of the semiconductor layer is etched at the same time, thereby reducing a photolithography process. <P>COPYRIGHT: (C)2012,JPO&INPIT |
