发明名称 MANUFACTURING METHOD OF SEMICONDUCTOR LIGHT-EMITTING ELEMENT
摘要 <P>PROBLEM TO BE SOLVED: To provide a manufacturing method of a semiconductor light-emitting element capable of minimizing increase in contact resistance between the semi-polar main surface of a gallium nitride based semiconductor layer and a palladium electrode. <P>SOLUTION: The manufacturing method of a semiconductor laser 100 includes a laminate formation step for forming a laminate 20 by arranging an active layer 14 and a p-type semiconductor layer 18 having a semi-polar main surface sequentially on the surface of a semiconductor substrate 10, a surface electrode formation step for forming a substrate product by forming a palladium electrode 38 to be bonded to the semi-polar main surface of the p-type semiconductor layer 18, and a processing step for processing the p-type semiconductor layer 18 and the palladium electrode 38. The p-type semiconductor layer 18 and the palladium electrode 38 are held in a state of temperature T(K) for a time t(min) so that the conditions represented by formula (1) are satisfied. (In the formula, &alpha;<SB POS="POST">1</SB>is 16870, &alpha;<SB POS="POST">2</SB>is 30.35-30.55). <P>COPYRIGHT: (C)2012,JPO&INPIT
申请公布号 JP2012069777(A) 申请公布日期 2012.04.05
申请号 JP20100213904 申请日期 2010.09.24
申请人 SUMITOMO ELECTRIC IND LTD 发明人 KUMANO TETSUYA;TOKUYAMA SHINJI
分类号 H01L33/40;H01L33/32 主分类号 H01L33/40
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