PHOTO-ALIGNMENT EXPOSURE APPARATUS AND PHOTO-ALIGNMENT EXPOSURE METHOD

摘要

[PROBLEM] To provide a photo-alignment exposure apparatus and a photo-alignment exposure method, whereby an alignment film having excellent characteristics can be formed. [SOLUTION] A photo-alignment exposure apparatus (1) of the present invention is characterized in being provided with: a radiation optical system (11), which includes a polarization light radiating means (12) and a polarization control element (14), and which radiates a beam to a substrate (2) having an alignment film on the surface; and a scanning means (15), which moves at least the substrate (2) or a part of the radiation optical system (11), and scans the substrate (2) in the predetermined scanning direction with the beam. The photo-alignment exposure apparatus is also characterized in that the polarization light radiating means (12) outputs linear polarization light to the polarization control element (14), the polarization control element (14) has unit polarization control regions disposed in the direction that orthogonally intersects the scanning direction, and the polarization direction of the beam radiated from the unit polarization control regions periodically changes by the predetermined number of unit polarization control regions, and within the period, the polarization direction is substantially symmetric with respect to the flat surface that is parallel to the scanning direction and is substantially symmetric with respect to the flat surface that orthogonally intersects the substrate.