| 摘要 |
<p>The present invention provides an exposure apparatus which forms a pattern on a substrate, the apparatus including an electron optical system (10) configured to guide a charged particle beam onto the substrate (ST), a stage (20) configured to hold the substrate, an electromagnetic actuator (32) configured to drive the stage, a magnetic shield (34) which is placed in the stage so as to surround the electromagnetic actuator, a measurement member (50) configured to measure a position of the stage, a coil member (60) configured to generate a magnetic field on a path of the charged particle beam between the electron optical system and the substrate, and a control member (90) configured to control the coil member so as to reduce a fluctuation of the magnetic field on the path, the magnetic field on the path fluctuating while the stage being driven by the electromagnetic actuator, based on the position of the stage measured by the measurement member.</p> |
