PROJECTION OPTICAL ASSEMBLY, PROJECTION OPTICAL ASSEMBLY ADJUSTMENT METHOD, EXPOSURE DEVICE, EXPOSURE METHOD, AND DEVICE MANUFACTURING METHOD

摘要

Provided is a projection optical assembly capable of reducing aberration fluctuations arising from light illumination. A projection optical assembly which employs light of a prescribed wavelength to form a first surface image on a second surface comprises a correction material which causes an aberration to arise in an inclination opposite to an inclination of an aberration which arises in the projection optical assembly as a result being illuminated with the light at the prescribed wavelength. The correction material is a light-permeable material having an absorption loss on the light of the prescribed wavelength of 2% or more. For example, at least one or the other of a substrate of the correction material and a thin film on the substrate has an absorption loss on the light of the prescribed wavelength of 2% or more.